光(guang)(guang)(guang)刻(ke)胶(jiao)供(gong)应(ying)商(shang)(shang)与(yu)客户(hu)粘(zhan)性大；一(yi)般情况下，为了(le)保持光(guang)(guang)(guang)刻(ke)胶(jiao)供(gong)应(ying)和效果(guo)的(de)(de)(de)(de)稳(wen)定，下游客户(hu)与(yu)光(guang)(guang)(guang)刻(ke)胶(jiao)供(gong)应(ying)商(shang)(shang)一(yi)旦建(jian)立(li)供(gong)应(ying)关系(xi)后，不会(hui)轻易更(geng)换。通(tong)过(guo)建(jian)立(li)反馈机制(zhi)(zhi)，满足(zu)个性化需(xu)(xu)求(qiu)，光(guang)(guang)(guang)刻(ke)胶(jiao)供(gong)应(ying)商(shang)(shang)与(yu)客户(hu)的(de)(de)(de)(de)粘(zhan)性不断增加(jia)。后来者(zhe)想要(yao)(yao)加(jia)入到(dao)供(gong)应(ying)商(shang)(shang)行(xing)列(lie)，往往需(xu)(xu)要(yao)(yao)满足(zu)比现(xian)有(you)供(gong)应(ying)商(shang)(shang)更(geng)高(gao)的(de)(de)(de)(de)要(yao)(yao)求(qiu)。所(suo)以光(guang)(guang)(guang)刻(ke)胶(jiao)行(xing)业对新进(jin)入者(zhe)壁垒(lei)(lei)较高(gao)。通(tong)常光(guang)(guang)(guang)刻(ke)胶(jiao)等微电(dian)子(zi)(zi)化学(xue)品(pin)不仅品(pin)质要(yao)(yao)求(qiu)高(gao)，而且需(xu)(xu)要(yao)(yao)多(duo)种(zhong)不同的(de)(de)(de)(de)品(pin)类满足(zu)下游客户(hu)多(duo)样化的(de)(de)(de)(de)需(xu)(xu)。如果(guo)没有(you)规模效益(yi)，供(gong)应(ying)商(shang)(shang)就无(wu)法承(cheng)担满足(zu)多(duo)样化需(xu)(xu)求(qiu)带(dai)来的(de)(de)(de)(de)开销。因(yin)此，品(pin)种(zhong)规模构成了(le)进(jin)入该行(xing)业的(de)(de)(de)(de)重要(yao)(yao)壁垒(lei)(lei)。广东(dong)省科学(xue)院半导体研究所(suo)。光(guang)(guang)(guang)刻(ke)技术是一(yi)种(zhong)重要(yao)(yao)的(de)(de)(de)(de)微电(dian)子(zi)(zi)制(zhi)(zhi)造(zao)技术，可(ke)以制(zhi)(zhi)造(zao)出高(gao)精度的(de)(de)(de)(de)微电(dian)子(zi)(zi)器件。中山光(guang)(guang)(guang)刻(ke)代(dai)工

光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)是一种特殊的(de)(de)(de)(de)(de)聚(ju)合物材(cai)料，主要用于半(ban)导(dao)体(ti)工业(ye)中(zhong)(zhong)的(de)(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)过(guo)(guo)程。在(zai)(zai)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)过(guo)(guo)程中(zhong)(zhong)，光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)起着(zhe)非(fei)常(chang)重(zhong)要的(de)(de)(de)(de)(de)作(zuo)(zuo)(zuo)用。它(ta)可(ke)(ke)以(yi)(yi)通(tong)(tong)过(guo)(guo)光(guang)(guang)(guang)(guang)(guang)(guang)化(hua)学反(fan)应(ying)来形成(cheng)(cheng)图(tu)(tu)案，从(cong)而实现对(dui)半(ban)导(dao)体(ti)芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)的(de)(de)(de)(de)(de)精确制(zhi)(zhi)造(zao)。具(ju)体(ti)来说，光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)的(de)(de)(de)(de)(de)作(zuo)(zuo)(zuo)用主要有以(yi)(yi)下几个方(fang)面：1.光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)(ke)以(yi)(yi)作(zuo)(zuo)(zuo)为光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)模板(ban)。在(zai)(zai)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)过(guo)(guo)程中(zhong)(zhong)，光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)被(bei)涂覆在(zai)(zai)半(ban)导(dao)体(ti)芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)表(biao)面，然后通(tong)(tong)过(guo)(guo)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)机(ji)器上(shang)的(de)(de)(de)(de)(de)模板(ban)来照射。光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)会(hui)在(zai)(zai)模板(ban)的(de)(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)(guang)照区域发生(sheng)化(hua)学反(fan)应(ying)，形成(cheng)(cheng)图(tu)(tu)案。2.光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)(ke)以(yi)(yi)保护芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)表(biao)面。在(zai)(zai)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)过(guo)(guo)程中(zhong)(zhong)，光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)(ke)以(yi)(yi)起到(dao)保护芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)表(biao)面的(de)(de)(de)(de)(de)作(zuo)(zuo)(zuo)用。光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)(ke)以(yi)(yi)防(fang)止芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)表(biao)面受到(dao)化(hua)学腐蚀或机(ji)械损伤。3.光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)(ke)以(yi)(yi)控制(zhi)(zhi)芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)的(de)(de)(de)(de)(de)形状和(he)尺寸(cun)(cun)。在(zai)(zai)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)过(guo)(guo)程中(zhong)(zhong)，光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)(ke)以(yi)(yi)通(tong)(tong)过(guo)(guo)控制(zhi)(zhi)光(guang)(guang)(guang)(guang)(guang)(guang)照的(de)(de)(de)(de)(de)时间和(he)强度(du)来控制(zhi)(zhi)芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)的(de)(de)(de)(de)(de)形状和(he)尺寸(cun)(cun)。这样就可(ke)(ke)以(yi)(yi)实现对(dui)芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)的(de)(de)(de)(de)(de)精确制(zhi)(zhi)造(zao)。总之，光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)在(zai)(zai)半(ban)导(dao)体(ti)工业(ye)中(zhong)(zhong)起着(zhe)非(fei)常(chang)重(zhong)要的(de)(de)(de)(de)(de)作(zuo)(zuo)(zuo)用。它(ta)可(ke)(ke)以(yi)(yi)通(tong)(tong)过(guo)(guo)光(guang)(guang)(guang)(guang)(guang)(guang)化(hua)学反(fan)应(ying)来形成(cheng)(cheng)图(tu)(tu)案，从(cong)而实现对(dui)半(ban)导(dao)体(ti)芯(xin)(xin)片(pian)(pian)(pian)(pian)(pian)的(de)(de)(de)(de)(de)精确制(zhi)(zhi)造(zao)。功率(lv)器件光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)加工厂商光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)技术利用光(guang)(guang)(guang)(guang)(guang)(guang)敏材(cai)料和(he)光(guang)(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)来制(zhi)(zhi)造(zao)微小的(de)(de)(de)(de)(de)图(tu)(tu)案和(he)结构。

光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)是(shi)一种特殊的(de)(de)(de)(de)(de)(de)(de)聚合物材料，广(guang)泛应(ying)用(yong)(yong)于半导体(ti)、光(guang)电子、微(wei)(wei)电子等(deng)领域的(de)(de)(de)(de)(de)(de)(de)微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)中。在(zai)光(guang)刻(ke)(ke)过(guo)程(cheng)中，光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)的(de)(de)(de)(de)(de)(de)(de)作(zuo)用(yong)(yong)是(shi)将(jiang)光(guang)学(xue)(xue)(xue)图(tu)案转移到(dao)(dao)基(ji)(ji)板(ban)表(biao)(biao)面，形成(cheng)所需的(de)(de)(de)(de)(de)(de)(de)微(wei)(wei)纳(na)(na)米结(jie)构。光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)的(de)(de)(de)(de)(de)(de)(de)基(ji)(ji)本原理是(shi)利用(yong)(yong)紫(zi)外(wai)线(xian)照射使其发生(sheng)化学(xue)(xue)(xue)反(fan)应(ying)，形成(cheng)交联聚合物，从(cong)而(er)形成(cheng)所需的(de)(de)(de)(de)(de)(de)(de)微(wei)(wei)纳(na)(na)米结(jie)构。光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)的(de)(de)(de)(de)(de)(de)(de)选择(ze)和(he)使用(yong)(yong)对于微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)的(de)(de)(de)(de)(de)(de)(de)成(cheng)功(gong)(gong)至(zhi)(zhi)关重要(yao)，因为它直(zhi)接影响到(dao)(dao)微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)的(de)(de)(de)(de)(de)(de)(de)精度(du)、分辨(bian)率和(he)成(cheng)本。在(zai)光(guang)刻(ke)(ke)过(guo)程(cheng)中，光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)的(de)(de)(de)(de)(de)(de)(de)作(zuo)用(yong)(yong)主要(yao)有以(yi)下几个(ge)方面：1.光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)可以(yi)作(zuo)为光(guang)学(xue)(xue)(xue)图(tu)案的(de)(de)(de)(de)(de)(de)(de)传(chuan)递(di)介质(zhi)，将(jiang)光(guang)学(xue)(xue)(xue)图(tu)案转移到(dao)(dao)基(ji)(ji)板(ban)表(biao)(biao)面。2.光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)可以(yi)起到(dao)(dao)保护基(ji)(ji)板(ban)的(de)(de)(de)(de)(de)(de)(de)作(zuo)用(yong)(yong)，防(fang)止基(ji)(ji)板(ban)表(biao)(biao)面被(bei)污染或受到(dao)(dao)损伤。3.光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)可以(yi)控制微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)的(de)(de)(de)(de)(de)(de)(de)深度(du)和(he)形状，从(cong)而(er)实(shi)现(xian)所需的(de)(de)(de)(de)(de)(de)(de)微(wei)(wei)纳(na)(na)米结(jie)构。4.光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)可以(yi)提(ti)高微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)的(de)(de)(de)(de)(de)(de)(de)精度(du)和(he)分辨(bian)率，从(cong)而(er)实(shi)现(xian)更高的(de)(de)(de)(de)(de)(de)(de)微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)质(zhi)量。总(zong)之，光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)在(zai)微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)中起着至(zhi)(zhi)关重要(yao)的(de)(de)(de)(de)(de)(de)(de)作(zuo)用(yong)(yong)，它的(de)(de)(de)(de)(de)(de)(de)选择(ze)和(he)使用(yong)(yong)对于微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)的(de)(de)(de)(de)(de)(de)(de)成(cheng)功(gong)(gong)至(zhi)(zhi)关重要(yao)。随(sui)着微(wei)(wei)纳(na)(na)加(jia)(jia)工(gong)技(ji)术的(de)(de)(de)(de)(de)(de)(de)不断发展(zhan)，光(guang)刻(ke)(ke)胶(jiao)(jiao)(jiao)的(de)(de)(de)(de)(de)(de)(de)性能和(he)应(ying)用(yong)(yong)也将(jiang)不断得(de)到(dao)(dao)改进和(he)拓展(zhan)。

光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)是(shi)(shi)一种重要的(de)(de)材料(liao)，广泛应(ying)用(yong)(yong)于(yu)半导体、光(guang)(guang)(guang)(guang)电子、微(wei)电子等领(ling)域。不(bu)(bu)同(tong)(tong)类型(xing)的(de)(de)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)有(you)不(bu)(bu)同(tong)(tong)的(de)(de)优(you)点(dian)，下面是(shi)(shi)几种常(chang)见的(de)(de)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)的(de)(de)优(you)点(dian)：1.紫外光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)：紫外光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)具有(you)高(gao)分(fen)辨率、高(gao)灵敏度(du)(du)、高(gao)对(dui)(dui)比度(du)(du)等优(you)点(dian)。它可(ke)以(yi)(yi)制(zhi)(zhi)备(bei)出(chu)(chu)高(gao)精度(du)(du)的(de)(de)微(wei)结(jie)构，适(shi)(shi)用(yong)(yong)于(yu)制(zhi)(zhi)造高(gao)密(mi)度(du)(du)的(de)(de)集(ji)成电路和(he)(he)(he)微(wei)机电系统(tong)。2.电子束(shu)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)：电子束(shu)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)具有(you)极(ji)高(gao)的(de)(de)分(fen)辨率和(he)(he)(he)精度(du)(du)，可(ke)以(yi)(yi)制(zhi)(zhi)备(bei)出(chu)(chu)亚微(wei)米(mi)(mi)级(ji)别的(de)(de)微(wei)结(jie)构。它适(shi)(shi)用(yong)(yong)于(yu)制(zhi)(zhi)造高(gao)速、高(gao)频率的(de)(de)微(wei)电子器件。3.X射线光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)：X射线光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)具有(you)极(ji)高(gao)的(de)(de)分(fen)辨率和(he)(he)(he)深度(du)(du)，可(ke)以(yi)(yi)制(zhi)(zhi)备(bei)出(chu)(chu)纳米(mi)(mi)级(ji)别的(de)(de)微(wei)结(jie)构。它适(shi)(shi)用(yong)(yong)于(yu)制(zhi)(zhi)造高(gao)密(mi)度(du)(du)、高(gao)速的(de)(de)微(wei)电子器件。4.热致变形(xing)(xing)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)：热致变形(xing)(xing)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)具有(you)高(gao)分(fen)辨率、高(gao)灵敏度(du)(du)、高(gao)对(dui)(dui)比度(du)(du)等优(you)点(dian)。它可(ke)以(yi)(yi)制(zhi)(zhi)备(bei)出(chu)(chu)高(gao)精度(du)(du)的(de)(de)微(wei)结(jie)构，适(shi)(shi)用(yong)(yong)于(yu)制(zhi)(zhi)造微(wei)机电系统(tong)和(he)(he)(he)光(guang)(guang)(guang)(guang)学(xue)器件。总(zong)之，不(bu)(bu)同(tong)(tong)类型(xing)的(de)(de)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)有(you)不(bu)(bu)同(tong)(tong)的(de)(de)优(you)点(dian)，可(ke)以(yi)(yi)根据具体的(de)(de)应(ying)用(yong)(yong)需求选(xuan)择(ze)合适(shi)(shi)的(de)(de)光(guang)(guang)(guang)(guang)刻(ke)(ke)胶(jiao)(jiao)。光(guang)(guang)(guang)(guang)刻(ke)(ke)技术是(shi)(shi)集(ji)成电路制(zhi)(zhi)造中利(li)用(yong)(yong)光(guang)(guang)(guang)(guang)学(xue)- 化(hua)学(xue)反应(ying)原理(li)和(he)(he)(he)化(hua)学(xue)、物(wu)理(li)刻(ke)(ke)蚀方(fang)法(fa)。

光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)是一(yi)种(zhong)用(yong)(yong)(yong)(yong)于(yu)(yu)微(wei)电(dian)(dian)子(zi)(zi)制(zhi)(zhi)造(zao)(zao)中的(de)(de)(de)(de)重要材料，它可(ke)以(yi)(yi)(yi)通(tong)(tong)(tong)过光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)技术将图案转(zhuan)移到硅(gui)片上。根据不(bu)同的(de)(de)(de)(de)应(ying)用(yong)(yong)(yong)(yong)需(xu)求(qiu)，光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)可(ke)以(yi)(yi)(yi)分(fen)(fen)为以(yi)(yi)(yi)下(xia)几(ji)种(zhong)类型：1.紫外(wai)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)：紫外(wai)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)是更常用(yong)(yong)(yong)(yong)的(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)之(zhi)一(yi)，它可(ke)以(yi)(yi)(yi)通(tong)(tong)(tong)过紫外(wai)线照射(she)来固化(hua)(hua)。紫外(wai)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)具有(you)(you)高分(fen)(fen)辨(bian)(bian)(bian)率(lv)、高灵敏度(du)和(he)高精(jing)(jing)(jing)度(du)等优点，适(shi)用(yong)(yong)(yong)(yong)于(yu)(yu)制(zhi)(zhi)造(zao)(zao)微(wei)小结(jie)(jie)构和(he)高密(mi)度(du)集(ji)成(cheng)电(dian)(dian)路(lu)。2.电(dian)(dian)子(zi)(zi)束(shu)(shu)(shu)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)：电(dian)(dian)子(zi)(zi)束(shu)(shu)(shu)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)是一(yi)种(zhong)高分(fen)(fen)辨(bian)(bian)(bian)率(lv)的(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)，它可(ke)以(yi)(yi)(yi)通(tong)(tong)(tong)过电(dian)(dian)子(zi)(zi)束(shu)(shu)(shu)照射(she)来固化(hua)(hua)。电(dian)(dian)子(zi)(zi)束(shu)(shu)(shu)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)具有(you)(you)极高的(de)(de)(de)(de)分(fen)(fen)辨(bian)(bian)(bian)率(lv)和(he)精(jing)(jing)(jing)度(du)，适(shi)用(yong)(yong)(yong)(yong)于(yu)(yu)制(zhi)(zhi)造(zao)(zao)微(wei)小结(jie)(jie)构和(he)高精(jing)(jing)(jing)度(du)器(qi)件(jian)。3.X射(she)线光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)：X射(she)线光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)是一(yi)种(zhong)高分(fen)(fen)辨(bian)(bian)(bian)率(lv)的(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)，它可(ke)以(yi)(yi)(yi)通(tong)(tong)(tong)过X射(she)线照射(she)来固化(hua)(hua)。X射(she)线光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)具有(you)(you)极高的(de)(de)(de)(de)分(fen)(fen)辨(bian)(bian)(bian)率(lv)和(he)精(jing)(jing)(jing)度(du)，适(shi)用(yong)(yong)(yong)(yong)于(yu)(yu)制(zhi)(zhi)造(zao)(zao)微(wei)小结(jie)(jie)构和(he)高精(jing)(jing)(jing)度(du)器(qi)件(jian)。4.离(li)子(zi)(zi)束(shu)(shu)(shu)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)：离(li)子(zi)(zi)束(shu)(shu)(shu)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)是一(yi)种(zhong)高分(fen)(fen)辨(bian)(bian)(bian)率(lv)的(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)，它可(ke)以(yi)(yi)(yi)通(tong)(tong)(tong)过离(li)子(zi)(zi)束(shu)(shu)(shu)照射(she)来固化(hua)(hua)。离(li)子(zi)(zi)束(shu)(shu)(shu)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)具有(you)(you)极高的(de)(de)(de)(de)分(fen)(fen)辨(bian)(bian)(bian)率(lv)和(he)精(jing)(jing)(jing)度(du)，适(shi)用(yong)(yong)(yong)(yong)于(yu)(yu)制(zhi)(zhi)造(zao)(zao)微(wei)小结(jie)(jie)构和(he)高精(jing)(jing)(jing)度(du)器(qi)件(jian)。总(zong)之(zhi)，不(bu)同类型的(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)适(shi)用(yong)(yong)(yong)(yong)于(yu)(yu)不(bu)同的(de)(de)(de)(de)应(ying)用(yong)(yong)(yong)(yong)需(xu)求(qiu)，制(zhi)(zhi)造(zao)(zao)微(wei)电(dian)(dian)子(zi)(zi)器(qi)件(jian)时(shi)需(xu)要根据具体情况选择合适(shi)的(de)(de)(de)(de)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)。表(biao)面有(you)(you)颗粒、滴胶(jiao)(jiao)(jiao)后精(jing)(jing)(jing)致时(shi)间(jian)过长，部分(fen)(fen)光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)固话，解决(jue)的(de)(de)(de)(de)方法主要有(you)(you)更换光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)胶(jiao)(jiao)(jiao)。中山光(guang)(guang)(guang)(guang)(guang)刻(ke)(ke)(ke)(ke)(ke)代工

光刻技术的精度(du)和分辨率越高，制造的器(qi)件(jian)越小，应用范围越广(guang)。中(zhong)山光刻代工(gong)

正胶(jiao)(jiao)光(guang)(guang)(guang)(guang)(guang)刻(ke)的(de)基本流程(cheng)：衬底清洗(xi)、前(qian)(qian)烘(hong)以(yi)及(ji)预处理，涂胶(jiao)(jiao)、软(ruan)烘(hong)、曝光(guang)(guang)(guang)(guang)(guang)、显(xian)影(ying)(ying)、图(tu)形(xing)(xing)检查，后烘(hong)。负(fu)胶(jiao)(jiao)光(guang)(guang)(guang)(guang)(guang)刻(ke)的(de)基本流程(cheng)：衬底清洗(xi)、前(qian)(qian)烘(hong)以(yi)及(ji)预处理、涂胶(jiao)(jiao)、软(ruan)烘(hong)、曝光(guang)(guang)(guang)(guang)(guang)、后烘(hong)、显(xian)影(ying)(ying)、图(tu)形(xing)(xing)检查。正胶(jiao)(jiao)曝光(guang)(guang)(guang)(guang)(guang)前(qian)(qian)，光(guang)(guang)(guang)(guang)(guang)刻(ke)胶(jiao)(jiao)不溶于(yu)显(xian)影(ying)(ying)液(ye)(ye)(ye)，曝光(guang)(guang)(guang)(guang)(guang)后，曝光(guang)(guang)(guang)(guang)(guang)区溶于(yu)显(xian)影(ying)(ying)液(ye)(ye)(ye)，图(tu)形(xing)(xing)与掩膜版图(tu)形(xing)(xing)相同(tong)；而负(fu)性光(guang)(guang)(guang)(guang)(guang)刻(ke)胶(jiao)(jiao)，曝光(guang)(guang)(guang)(guang)(guang)前(qian)(qian)光(guang)(guang)(guang)(guang)(guang)刻(ke)胶(jiao)(jiao)可(ke)(ke)溶于(yu)显(xian)影(ying)(ying)液(ye)(ye)(ye)，曝光(guang)(guang)(guang)(guang)(guang)后，被曝光(guang)(guang)(guang)(guang)(guang)区不溶于(yu)显(xian)影(ying)(ying)液(ye)(ye)(ye)，图(tu)形(xing)(xing)与掩膜版图(tu)形(xing)(xing)相同(tong)。光(guang)(guang)(guang)(guang)(guang)刻(ke)可(ke)(ke)能(neng)会出(chu)现显(xian)影(ying)(ying)不干净的(de)异常，主要原因(yin)可(ke)(ke)能(neng)是显(xian)影(ying)(ying)时(shi)(shi)间(jian)不足、显(xian)影(ying)(ying)溶液(ye)(ye)(ye)使用周期过长，溶液(ye)(ye)(ye)溶解胶(jiao)(jiao)量较(jiao)多、曝光(guang)(guang)(guang)(guang)(guang)时(shi)(shi)间(jian)不足，主要的(de)解决方法有增加显(xian)影(ying)(ying)时(shi)(shi)间(jian)、更换新(xin)的(de)显(xian)影(ying)(ying)液(ye)(ye)(ye)，增强溶液(ye)(ye)(ye)溶解能(neng)力、增加曝光(guang)(guang)(guang)(guang)(guang)时(shi)(shi)间(jian)。中(zhong)山(shan)光(guang)(guang)(guang)(guang)(guang)刻(ke)代工(gong)

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